钛酸锶（SrTiO3）铝酸镧（LaAlO3） wafer
WaferHome can manufacture 钛酸锶（SrTiO3）铝酸镧（LaAlO3）晶体 Wafer
Specification for 钛酸锶（SrTiO3）铝酸镧（LaAlO3） wafer
| Grade（等级） | Dimeter（直径） | Type/dopant（类型/掺杂） |
Orientaion |
crystal struction | dielectric constant | coefficient of thermal expansion | Resistivity（电阻率） | dopant element concentration | Flat |
Surface/Roughness（表面粗糙度） | Geometric parameter |
|---|---|---|---|---|---|---|---|---|---|---|---|
| 钛酸锶晶体（SrTiO3） wafer | 25.4mm 50.8mm |
intrinsic | <100><111> |
hexagonal tetragonal | 300 | 10.4×10 -6/℃ | N/A 16mm 22.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um | ||
| 钛酸锶晶体（SrTiO3） wafer | 25.4mm 50.8mm |
铌(Nb) | <100><111> |
hexagonal tetragonal | 300 | 10.4×10 -6/℃ | 0.0035 - 0.08ohm-cm | 1% - 0.1% | N/A 16mm 22.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |
| 钛酸锶晶体（SrTiO3） wafer | 25.4mm 50.8mm |
钕(Nd) | <100><111> |
hexagonal tetragonal | 300 | 10.4×10 -6/℃ | 0.0035 - 0.08ohm-cm | 1% - 0.1% | N/A 16mm 22.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |
| 钛酸锶晶体（SrTiO3） wafer | 25.4mm 50.8mm |
Fe | <100><111> |
hexagonal tetragonal | 300 | 10.4×10 -6/℃ | 0.0035 - 0.08ohm-cm | 1% - 0.1% | N/A 16mm 22.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |
| 铝酸镧（LaAlO3）wafer | 25.4mm 50.8mm | intrinsic/Mg/Fe | <100><111> | hexagona tetragonal | 21 | 9.4x10-6 |
0.9 - 9 *E11 ohm-cm | 1.0*E11 - 9.9 *E19 ohm-cm |
N/A 16mm 22.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |